how does chemical vapor deposition work

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ChemicalVapor Deposition (CVD) is a process in which the substrate is exposed to one or more volatile precursors,which react and/or decompose on the substrate surface to produce the desired thin film deposit. From: Handbook of Deposition Technologies for Films and Coatings (Third Edition),2010

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  • What is the purpose of chemical vapor deposition?

  • Publisher Summary. Chemical vapor deposition (CVD) is a technology used for forming solid powders in the gas phase or depositing films on substrates from precursors in the gas phase. Many precursors are liquids or solids under ordinary conditions, and they are first vaporized for use in CVD.

  • What is chemical vapor deposition (CVD)?

  • Chemical Vapor Deposition (CVD) is a process in which the substrate is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired thin film deposit. From: Handbook of Deposition Technologies for Films and Coatings (Third Edition), 2010 Mona Mittal, …

  • What are the critical parameters of chemical vapor deposition?

  • 鈥? The critical parameters are physical (temperature, pressure, voltage applied, etc.) Chemical Vapor Deposition (CVD) 鈥? Deposition can also take place due to a chemical reaction between some reactants on the substrate. 鈥? In this case reactant gases (precursors) are pumped in to a reaction chamber (reactor).

  • How does CVD work in vacuum?

  • Several gases are admitted into the vacuum chamber through inlet and after dissociation between the species, the newly formed chemical molecules are deposited on the heated substrate as shown in Fig. 10.4. Figure 10.4. Typical set up for CVD technique.

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