how does chemical vapor deposition work

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ChemicalVapor Deposition (CVD) is a process in which the substrate is exposed to one or more volatile precursors,which react and/or decompose on the substrate surface to produce the desired thin film deposit. From: Handbook of Deposition Technologies for Films and Coatings (Third Edition),2010

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  • What is chemical vapor deposition?

  • Chemical Vapor Deposition (CVD) is a process in which the substrate is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired thin film deposit. From: Handbook of Deposition Technologies for Films and Coatings (Third Edition), 2010 Ajit Behera, …

  • What is plasma assisted chemical vapour deposition (CVD)?

  • 鈥?Plasma Assisted Chemical Vapour Deposition (PACVD) or Plasma Enhanced Chemical Vapour Deposition (PECVD) How Does CVD Work? Precursor gases (often diluted in carrier gases) are delivered into the reaction chamber at approximately ambient temperatures.

  • How does CVD work in vacuum?

  • Several gases are admitted into the vacuum chamber through inlet and after dissociation between the species, the newly formed chemical molecules are deposited on the heated substrate as shown in Fig. 10.4. Figure 10.4. Typical set up for CVD technique.

  • What is the rate of CVD coating deposition?

  • CVD coatings are usually only a few microns thick and are generally deposited at fairly slow rates, usually of the order of a few hundred microns per hour. A CVD apparatus will consist of several basic components:

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